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"Sub-Wavelength Lithography and Microscopy"

M. Suhail Zubairy
Institute for Quantum Science and Engineering and
Department of Physics and Astronomy
Texas A&M University


It is well known that the classical schemes for microscopy and lithography are restricted by the diffraction limit. For example, the precision with which a pattern could be etched in interference lithography is limited by the wavelength of the light. Similarly the precision with which we can measure the distance between two objects is also limited by the wavelength of the light used. In this talk we will discuss schemes to overcome this limit in both optical lithography and microscopy. In the first part we shall present quantum optical methods to do the subwavelength lithography. We shall first discuss the methods for sub-wavelength lithography. In particular, we shall discuss a method in which the subwavelength pattern can be achieved by inducing the multi-Rabi oscillations between the atomic levels. This proposed method does not require multiphoton absorption and/or the entanglement of photons. In the second part of the talk we shall discuss how resonance fluorescence spectrum of the atoms in a standing light field can be used for sub-wavelength atom localization as well as for atom microscopy.

Tuesday, April 3, 2012
IQSE 578, 12:30 p.m.
Mitchell Physics Building

Institute for Quantum Science and Engineering
Texas A&M University

(Brown Bag Lunch)